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Optimization of a high current pulse discharge in gas filled capillary for application purposes - Ar8+ laser 46.9 nm
Štraus, Jaroslav ; Koláček, Karel (advisor) ; Jančárek, Alexandr (referee) ; Wild, Jan (referee)
The aim of the thesis was to complete the development of the Czech version of the extremal ultraviolet (XUV) argon capillary laser working at the wavelength 46.9 nm and its adaptation for the first practical applications. A multi-discipline complex of mutually interconnected problems was analyzed and studied: The reasons for a capillary low life-time were investigated using defectoscopic methods, a pre- pulse regime influence was studied with the help of spectroscopy on a physical model. By performing necessary construction and technology changes as well as by the multi-parametric optimisation of working regime, the indicated weaknesses were suppressed. The XUV laser was focused into a footprint of the size about 100 µm and the apparatus was extended by a set of practical aids and accessories for special applications, especially for exposition of the samples at extreme temperatures. As practical applications of the XUV laser, measurements of multilayer mirror reflectivity and filter transmissivity were performed. Using the XUV laser for a thin layer deposition and radiation resistance testing was verified to be practicable in principle. Probably a first temperature dependence of an XUV laser ablation rate was measured, in the temperature range from -180 deg.C to +200 deg.C, on BaF2.
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Characterization and focusing of capillary-discharge XUV-laser beam for purposes of thin-film deposition
Pira, Peter ; Wild, Jan (advisor)
Title: Characterization and focusing of capillary-discharge XUV-laser beam for purposes of thin-film deposition Author: Peter Pira Department: Department of Surface and Plasma Science Supervisor: doc. RNDr. Jan Wild, CSc., Department of Surface and Plasma Science Abstract: The paper deals with the first results of the interaction of a desk-top high repetition rate XUV laser (wavelength of 46.9 nm) radiation with materials suitable for optoelectronics, in particular the ionic crystals CsI, LiF, etc. Using surface physics methods (AFM, DIC Normanski microscopy) pulse laser imprints were investigated. Based on the results obtained, general information on the nature of ablation and desorption was obtained, which were compared with the results of the XUV-ABLATOR modified code modeling. Plasma arising from ablation was examined by a modified Langmuir probe system. The main result is the pulse laser deposition of thin films of Bi and CsI. Keywords: ablation, Pulsed Laser Deposition, XUV laser
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Characterization and focusing of capillary-discharge XUV-laser beam for purposes of thin-film deposition
Pira, Peter ; Wild, Jan (advisor)
Title: Characterization and focusing of capillary-discharge XUV-laser beam for purposes of thin-film deposition Author: Peter Pira Department: Department of Surface and Plasma Science Supervisor: doc. RNDr. Jan Wild, CSc., Department of Surface and Plasma Science Abstract: The paper deals with the first results of the interaction of a desk-top high repetition rate XUV laser (wavelength of 46.9 nm) radiation with materials suitable for optoelectronics, in particular the ionic crystals CsI, LiF, etc. Using surface physics methods (AFM, DIC Normanski microscopy) pulse laser imprints were investigated. Based on the results obtained, general information on the nature of ablation and desorption was obtained, which were compared with the results of the XUV-ABLATOR modified code modeling. Plasma arising from ablation was examined by a modified Langmuir probe system. The main result is the pulse laser deposition of thin films of Bi and CsI. Keywords: ablation, Pulsed Laser Deposition, XUV laser
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Characterization and focusing of capillary-discharge XUV-laser beam for purposes of thin-film deposition
Pira, Peter ; Wild, Jan (advisor) ; Čuba, Václav (referee) ; Tichý, Milan (referee)
Title: Characterization and focusing of capillary-discharge XUV-laser beam for purposes of thin-film deposition Author: Peter Pira Department: Department of Surface and Plasma Science Supervisor: doc. RNDr. Jan Wild, CSc., Department of Surface and Plasma Science Abstract: The paper deals with the first results of the interaction of a desk-top high repetition rate XUV laser (wavelength of 46.9 nm) radiation with materials suitable for optoelectronics, in particular the ionic crystals CsI, LiF, etc. Using surface physics methods (AFM, DIC Normanski microscopy) pulse laser imprints were investigated. Based on the results obtained, general information on the nature of ablation and desorption was obtained, which were compared with the results of the XUV-ABLATOR modified code modeling. Plasma arising from ablation was examined by a modified Langmuir probe system. The main result is the pulse laser deposition of thin films of Bi and CsI. Keywords: ablation, Pulsed Laser Deposition, XUV laser
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Optimization of a high current pulse discharge in gas filled capillary for application purposes - Ar8+ laser 46.9 nm
Štraus, Jaroslav ; Koláček, Karel (advisor) ; Jančárek, Alexandr (referee) ; Wild, Jan (referee)
The aim of the thesis was to complete the development of the Czech version of the extremal ultraviolet (XUV) argon capillary laser working at the wavelength 46.9 nm and its adaptation for the first practical applications. A multi-discipline complex of mutually interconnected problems was analyzed and studied: The reasons for a capillary low life-time were investigated using defectoscopic methods, a pre- pulse regime influence was studied with the help of spectroscopy on a physical model. By performing necessary construction and technology changes as well as by the multi-parametric optimisation of working regime, the indicated weaknesses were suppressed. The XUV laser was focused into a footprint of the size about 100 µm and the apparatus was extended by a set of practical aids and accessories for special applications, especially for exposition of the samples at extreme temperatures. As practical applications of the XUV laser, measurements of multilayer mirror reflectivity and filter transmissivity were performed. Using the XUV laser for a thin layer deposition and radiation resistance testing was verified to be practicable in principle. Probably a first temperature dependence of an XUV laser ablation rate was measured, in the temperature range from -180 deg.C to +200 deg.C, on BaF2.
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Double pulse capillary discharge assessment for nitrogen soft X-ray laser.
Hübner, Jakub ; Nevrkla, M.
The work examines possibilities of capillary discharge pinching plasma driven by combination of two electric current pulses ("pedestal" slow exponentially damped sinus t1/4 > 200 ns, peak current Ipeak < 50 kA and fast triangular pulse with a rise time about 38 ns, Ipeak > 60 kA) to obtain the maximum possible gain at wavelength l = 13.4 nm (hydrogen-like nitrogen recombination scheme). The optimal initial density ρ0 (or pressure) and start time tstart of second triangular pulse (second pulse start at peak current Ipeak of the first pulse) were determined for two capillary radii (0.5 and 1 cm) and four current peaks of the first pulse (20, 30, 40 and 50 kA).\n
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